ຮັບສ່ວນຫຼຸດພິເສດຕາມປະລິມານ, ອັບເດດລາຄາຂາຍສົ່ງ ແລະ ການແຈ້ງເຕືອນສິນຄ້າໃໝ່ສົ່ງກົງເຖິງອິນບັອກຂອງທ່ານ.
ໂດຍການສະໝັກສະມາຊິກ, ທ່ານຍອມຮັບ ເງື່ອນໄຂການໃຫ້ບໍລິການ ແລະ ນະໂຍບາຍຄວາມເປັນສ່ວນຕົວ ຂອງພວກເຮົາ.
ເຂົ້າເຖິງຜູ້ຊ່ຽວຊານທີ່ໄດ້ຮັບການຢັ້ງຢືນຂອງພວກເຮົາໂດຍກົງ
- Plasma Power Range: 1000 ~ 8000W
- Process Applications: Remote delivery of gases for downstream chamber cleaning, reactive etching processes, and reactive deposition processes
- Ignition: 100 mTorr ~ 4.00 Torr, Ar < 1 slm
- Chemical Compatibility: This unit is intended for use with selected gases such as Ar, O2, H2, N2, F2, H2O, NF3, or O2: CxFy.
Note: Other gases and chemistries may be selected; contact AE Technical Support for suitable combinations.
NF3 Operating Specifications:
- Flow Range: Up to 6 slm at 12 Torr
- Pressure Range: Up to 15 Torr at 1 slm
- NF3 Dissociation Efficiency: > 98% dissociation at 6 slm and 7 Torr at 8 kW as measured by FTIR
Operating Specifications:
- Duty Cycle: Continuous operation within specified operating range
- Cooling Flow Rate: 2 gpm @ 8 kW and 25°C (77°F) input water
- Ambient Air: +5 ~ +40°C (+41 ~ +104°F)
AC Electrical Requirements:
- Input Voltage: 200/208 VAC ±10% (180 ~ 229 VAC), no neutral, 3 Φ with ground (Φ insensitive)
- Line Frequency: 50/60 Hz nominal; 47 ~ 63 Hz range
- Input Current: 27 A nominal, 31 A max per Φ
- Weight: 28.7 kg (63.2 lb)
- Size: H x W x D: 26.7 cm x 25.25 cm x 47.8 cm
- Demonstrated Reliability: > 450,000 h MTBF
