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FISCHER FISCHERSCOPE X-RAY XDV-MUE SEMI 涂层测厚仪

ModelFISCHERSCOPE X-RAY XDV-MUE SEMI
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Fully automated wafer handling and testing boost efficiency

XRF system with excellent detector sensitivity and high resolution

XRF system with polycapillary optics from the worldwide technology leader for measuring micro-spots 

Accurately tests structures up to 10 µm in diameter

Automatic pattern recognition pinpoints the positions to be measured

Multiple operating modes; manual measurement possible whenever required

Flexible: docking station for FOUP, SMIF and cassette, for 6", 8" and 12" wafers

Applications

- Coating Thickness Measurement:

Base metallization layers (UBM) at the nanometer scale

Thin lead-free solder caps on copper pillars

Extremely small contact surfaces and other complex 2.5D / 3D packaging applications

- Material Analysis:

C4 and smaller solder bumps

Lead-free solder caps on copper pillars

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