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Mask rotation: ±45˚
Mask size: Up to 9”x9”
Mask loading: vacuum and mechanical clamp
Mask/substrate pressure: User definable(Electronically Enhanced Hard Contact)
Chuck motion control: X,Y,Z & Theta(motorized joystick)
Exposure gap: 0-3000µm
Gap adjustment: 1µm
Mechanical resolution: 0.1µm
X,Y travel: ±5mm
Theta travel: ±4˚
Leveling: Automated wedge-compenstation system
Overlay accuracy: Top to back <2µm(3s)-Top side to 0.5µm
Substrate size: To 200mm square
Printing modes: Proximity , Soft , Hard and Vacuum Contact
Printing resolution:
Vacuum: submicron
Hard contact: to 1µm
Soft contact: to 2µm
Proximity: to 3-5µm with 15-20µm gap
Exposure time: 1-3200 seconds in 0.1 second increments
Alignment Optics Magnification:
Top: Continuous zoom - 70x to 400x
Optional 140x to 800x
Bottom 180x
Alignment Optics Separation:
Top: 42mm to outside of mask
Optional to 9mm
Bottom: 19mm to 200mm
Single microscope 0mm to 200mm
