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Johoyd M5000 Inverted Metallurgical Microscope

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Optical system: Infinity-corrected chromatic aberration correction optical system

Magnification: 50×~1000×

Eyepiece: 10× wide-field, high-eyepoint plan eyepiece, field number Φ22 mm

Objectives for brightfield configuration

Objective: Long working distance infinity-corrected semi-apochromatic metallurgical objective LMPlan FL 5×, N.A. 0.15, W.D. 21.0 mm

Objective: Long working distance infinity-corrected semi-apochromatic metallurgical objective LMPlan FL 10×, N.A. 0.3, W.D. 20.0 mm

Objective: Long working distance infinity-corrected semi-apochromatic metallurgical objective LMPlan FL 20×, N.A. 0.4, W.D. 15.0 mm

Objective: Long working distance infinity-corrected semi-apochromatic metallurgical objective LMPlan FL 50×, N.A. 0.75, W.D. 3.0 mm

Objective: Long working distance infinity-corrected semi-apochromatic metallurgical objective LMPlan FL 100×, N.A. 0.85, W.D. 3.0 mm (optional)

Objectives for brightfield/darkfield configuration

Objectives for brightfield/darkfield configuration: Infinity-corrected semi-apochromatic brightfield/darkfield metallurgical objective MPlanFL N 5XBD DIC, N.A. 0.15, W.D. 15.0 mm

Objectives for brightfield/darkfield configuration: Infinity-corrected semi-apochromatic brightfield/darkfield metallurgical objective MPlanFL N 10XBD DIC, N.A. 0.3, W.D. 8.4 mm

Objectives for brightfield/darkfield configuration: Infinity-corrected semi-apochromatic brightfield/darkfield metallurgical objective MPlanFL N 20XBD DIC, N.A. 0.45, W.D. 11.9 mm

Objectives for brightfield/darkfield configuration: Infinity-corrected semi-apochromatic brightfield/darkfield metallurgical objective MPlanFL N 50XBD, N.A. 0.75, W.D. 3.0 mm

Objectives for brightfield/darkfield configuration: Infinity-corrected semi-apochromatic brightfield/darkfield metallurgical objective MPlanFL N 100XBD, N.A. 0.9, W.D. 1.0 mm (optional)

Objectives for brightfield/darkfield configuration: Long working distance infinity-corrected apochromatic brightfield/darkfield metallurgical objective Meizs LMPlanAPO N 100XBD, N.A. 0.8, W.D. 3.0 mm (optional)

Observation tube: Hinged trinocular observation tube, 45° tilt, interpupillary distance adjustment 48–76 mm, two-position switching: 100% observation; 20% observation / 80% photomicrography

Objective nosepiece: Quintuple nosepiece
Focusing mechanism: Coaxial coarse/fine focusing, coarse travel 10 mm, fine travel 0.2 mm per rotation, graduation 2 µm, coarse adjustment with tension adjustment
Stage: Three-layer mechanical stage, area 210×180 mm, travel range 50×50 mm, vernier scale 0.1 mm
Illumination system12V/50W halogen lamp or 5W LED illumination (wide voltage input: 100V–240V)
Filter: Filter
Camera interface: 0.5× C-Mount interface (1×, 0.75× optional)
Polarizing device: Polarizer and analyzer (optional)
Scale: 0.01 mm precision scale (optional)
Industrial camera: 5-megapixel camera with image analysis and measurement software (optional)
Metallographic software: 2020 edition professional metallographic analysis and rating software (optional)

Datasheet

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